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Inert Nitrogen Etch Chamber
Offers low oxidation conditions for chemical etching
The RAPIDETCH Inert Nitrogen Etch Chamber is quickly mounted and demounted from the etching system. It is used when the package being etched required the lowest oxidizing conditions. The Etch Chamber includes a pressure-controllable plunger mechanism which replaces RAPIDETCH's arm mechanism. This ensures a controlled environment around the part being processed.
Product Highlights
- Achieve low oxidation conditions - to avoid corrosion of bond wires etc. during acid etch on copper and similar materials
- Used with a nitrogen feed
- Easy to mount and de-mount when required
| ORDER CODE | DESCRIPTION |
|---|---|
| 8477.1 | Inert Nitrogen Etch Chamber for RAPIDETCH |








