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PEEC Endpoint Characterization Introduced @ ISTFA 2013

November 5, 2013 -- San Jose, CA -- ULTRA TEC Manufacturing, Inc. (Santa Ana, CA) announces the availability of a new technology, PEEC, for use with its popular ASAP-1 IPS Digital Preparation System.

PEEC is a new, patent pending, characterization module for ASAP-1 IPS digital sample preparation system.PEEC improves sample preparation techniques, particularly at extremely thin remaining silicon thickness (RST).

PEEC offers several plotting and mapping modes that work in parallel with the ASAP-1 IPS, with the main polishing system acting as the Control Unit.


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