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SESAME 2000
Laser + Plasma Decapsulation System
SESAME PLASER Laser + Plasma Decapsulation System has been specifically designed for effective decapsulation of IC packages, containing either a single die or multiple dice.
At the system's heart is a Nd:YAG 1064nm diode-pumped LASER, which is housed inside a chamber to provide full protection from LASER radiation, in compliance with applicable VBG 93, DIN EN, and CE standards.
The integrated optical vision system provides constant sample monitoring. A previously-taken X-Ray or an Acoustic Microscope image can be superimposedonto the SESAME's live component image to provide additional data for successful decpasulation.
SESAME's intuitive software incorporates drawing tools for definition of the material to be removed which can be drawn onto the component image. The actual amount of material removed can be measured by camera focal-depth techniques or by using an external mechanical indicator.
Prior to the LASER ablation process, the component is scanned by a red pilot LASER. The system's firmware controls all process parameters such as power, frequency, scan speed and focal distance. All process parameters can be stored by specific component and product family for easy recall.
Following laser ablation, the die surface can be revealed with a low temperature wet etch, applied either manually (with a suitable dropper) or automatically (with an automated acid decapsulation machine), avoiding electric and mechanical alteration of the component.
NOTE: SESAME PLASER Technology incorporates mutual Patents and IP developed by CNES, BSET EQ and DIGIT CONCEPT SA
Product Highlights
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Circuitry can often be revealed without acid
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Complex-shaped cavities can be produced
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Exposure of components without destruction of Al, Cu, Au
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In subsequent acid clean-up operations, low temperature, low corrosion conditions can be used
Pre-thinning of ceramic packages for a back side access• Allow to reduce a lot the temperature of opening duringwet decap and also the opening times during Dry decapSESAME2000 option.Circuitry can often be revealed without acid• Exposure of components without destruction of Al, Cu,Au bondings• Glob top removal, Cross section preparationPackage Pre-opening : plastic, ceramic and MEMSPackage Pre-opening : plastic, ceramic and MEMSPackage Pre-opening : plastic, ceramic and MEMSPackage Pre-opening : plastic, ceramic and MEMS• Circuitry can often be revealed without acid• Exposure of components without destruction of Al, Cu,Au bondings• Glob top removal, Cross section preparation• Gaskets Maker, Bonding cut ,Thin PCB cut• All bonding access for shear test• Pre-thinning of ceramic packages for a back side access• Allow to reduce a lot the temperature of opening duringwet decap and also the opening times during Dry decapSESAME2000 option.
| ITEM | DESCRIPTION |
|---|---|
| Main Unit | PLASER Plasma Chamber with automatic door |
| Material Removal Method |
BSET FillerBlast™ |
| Filtering | Vacuum pump and Filter for particules |
| Mass Flow | 3 Mass Flow Controler for O2 and CF4 |
| Plasma type | ICP (Inductive Coupled Plasma) |
| RF | RF 300W generator |
| Gauging | Control Unit with automatic RF tune and Baratron vacuum Gauge |
| Controls |
Independant color LCD touchscreen gathering all the controls |
| Sample Thermal control | Thermal regulation of the sample stage (20/100°C) |
| Additional items | Mechanical parts for adaptation onto the SESAME |













